Description
Product Name: LAM 810-102361-222 Ion Source Module
Product Description: The LAM 810-102361-222 is an ion source module for LAM semiconductor etching equipment. It is used to generate ions that are used to etch semiconductor wafers.
Product Parameters:
- Ion type: Argon (Ar)
- Ion energy: 200 to 1000 eV
- Ion current: 0 to 100 mA
- Operating temperature: 0°C to 50°C
- Storage temperature: -20°C to 60°C
- Humidity: 5% to 95% non-condensing
- Vibration: 5 Hz to 150 Hz, 1 mm amplitude
- Shock: 15 g, 11 ms half sine
Specifications:
- Module dimensions: 300 mm x 200 mm x 100 mm
- Weight: 5 kg
Example applications:
- Semiconductor etching
- Thin film deposition
- Surface modification
The LAM 810-102361-222 is a high-performance ion source module that is suitable for a wide range of semiconductor manufacturing applications.
Please note that this is a general description of the product, and the specific parameters and specifications may vary depending on the specific model.
